Integrated setup for the fabrication and measurement of magnetoresistive nanoconstrictions in ultrahigh vacuum
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In one UHV dual-beam rig, Hamburg both carved magnetic nanostructures with a focused ion beam and measured their magnetoresistance, an MM3A-EM contacting each structure in turn.
This instrument paper presents a UHV system that both fabricates magnetic nanostructures with a focused ion beam and measures their magnetoresistance in situ. An MM3A-EM micromanipulator carrying a sharp tungsten tip contacts individual structures — an SEM column guides positioning — and a small electromagnet enables field-dependent measurements, so the many structures milled into a single film can each be addressed and measured.
