Nanoprobing · NW4

NW4

A load-lock platform hosting up to four MM3A-EM manipulators — nanoprobing and failure analysis on large substrates up to 120 × 120 mm.

Compatible
The NW4 platform — a load-lock-compatible base with space for up to four MM3A-EM micromanipulators arranged around a large substrate.
120 × 120 mmMax substrate size
3 fA @ 1 HzCurrent measurement limit
30 mmMax substrate thickness
up to 4 × MM3A-EMManipulators

Built for packaged parts#

Most nanoprobing platforms stop at die level. The NW4 covers the other end of the failure-analysis workflow: packaged devices and other large substrates up to 120 × 120 mm, with sample thicknesses up to 30 mm depending on how the load lock is used. Up to four MM3A-EM micromanipulators surround the sample, each on a low-noise signal lead, with a further low-noise lead for the sample or bulk; the measurement chain resolves currents down to 3 fA at 1 Hz. How much of that area the beam can image depends on your chamber dimensions.

Tips and samples through the load lock#

The load-lockable base lets you exchange samples and replace probe tips without breaking vacuum in the main chamber, keeping cycle times short and contamination low. And because the whole platform rides the microscope stage, you can land a probe and then track EBIC or EBAC traces between sites far apart on the substrate.

Drop-in partner for the PS8#

The NW4 uses the same vacuum-side hardware, mounting and connector as the Prober Shuttle PS8 — down to the same air-side controllers — so the two platforms swap in and out of one microscope. Run them in alternation and a single tool set covers everything from the most recent nodes to packaged samples.

Specifications

Technical data

Platform

Platform dimensions
162 × 134 mm
Max. substrate size
120 × 120 mm
Max. substrate thickness
30 mm (very large substrates may be limited to 6 mm)
Manipulator capacity
up to 4 × MM3A-EM
Load lock
Compatible
Connector
Same as Prober Shuttle PS8

Low-current measurement

Current measurement limit
3 fA @ 1 Hz
Insulation leakage
50 fA @ 1 V
Signal conductor resistance
6.5 Ω
Max. voltage
210 V
Max. current
200 mA

Three-axis micromanipulators

Range — A & B
240°
Range — C
12 mm
Speed — A & B
up to 10 mm/s
Speed — C
up to 2 mm/s
Resolution — A
0.35 nm (7 nrad)
Resolution — B
0.25 nm (7 nrad)
Resolution — C
0.05 nm
Dimensions
62.1 × 20.4 × 25.4 mm, 45 g
Lowest pressure
10⁻⁷ mbar
Drift
1 nm/min
Why it wins

Advantages

Package FA on large substrates

  • Probes packaged devices and substrates up to 120 × 120 mm
  • Accepts samples up to 30 mm thick, depending on load-lock use
  • Hosts up to four MM3A-EM manipulators on a 162 × 134 mm base
  • Low-noise signal leads for all four probes plus the sample/bulk

Probe exchange without breaking vacuum

  • Load-lockable base for sample exchange and tip replacement
  • Keeps cycle times short and the main chamber clean
  • The platform rides the microscope stage, so a landed probe can follow EBIC/EBAC traces across the substrate

Drop-in partner for the PS8

  • Same vacuum-side hardware, mounting and connector as the Prober Shuttle PS8
  • Runs from the same air-side controllers, so the two platforms alternate in one tool
  • Together they span die-level nodes to packaged parts

Low-current measurement

  • Resolves currents down to 3 fA at 1 Hz
  • Insulation leakage of 50 fA at 1 V
  • Signal conductor resistance of 6.5 Ω
  • Up to 210 V and 200 mA
Get in touch

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