Gas Injection System GIS
A gas-injection plug-in that meters precursors and gases into the SEM chamber in precise doses, through a proportional valve driven by a Nanomotor®.
Whatever precursor is on hand#
Fill the 0.5 ml reservoir with a solid or liquid precursor — water, hexane, naphthalene, tungsten hexacarbonyl, iodine, or something else entirely — and heat it to up to 90 °C to drive off vapour. Filling is a matter of removing the cap; swap that cap for an inlet instead and the same reservoir accepts gaseous precursors such as argon, oxygen or a gas mixture, no evaporation needed.
A nozzle built to let the beam through#
The nozzle tip is slanted for the gas flow, and a small aperture at its top keeps the electron or ion beam free to irradiate the area of interest while gas is flowing — you do not have to choose between imaging and dosing. A Nanomotor®-driven proportional valve gives the fine control that turns this into repeatable, minute doses, and the manipulator places the outlet exactly where the chemistry needs to happen.
From deposit to measurement#
That combination covers metal or carbon deposition, atomic layer deposition and charge compensation. Deposited tungsten structures like the ones shown here can be probed and characterized — EDX composition, four-point resistance — without leaving the chamber. Your existing micromanipulator system can be quickly and easily upgraded for use with the GIS-EM.
Nanomotor® is a registered trademark of Kleindiek Nanotechnik GmbH (Reutlingen) and Klocke Nanotechnik GmbH (Aachen).
Gallery
A tungsten deposit grown precursor-side with the GIS-EM, imaged at 2 µm. 
EDX of the deposit — 82.80% tungsten, with gallium from the FIB milling process. 
Two probes on the deposit measure a resistance of 20.4 Ω.
Technical data
Overview
- Reservoir volume
- 0.5 ml
- Maximum reservoir temperature
- 90 °C
- Wetted materials
- Teflon (PTFE), polyoxymethylene, stainless steel
Typical precursors
- Solid or liquid (heated to evaporate)
- Water, hexane, naphthalene, tungsten hexacarbonyl, iodine
- Gaseous (via inlet)
- Argon, oxygen, gas mixtures
Applications
- Deposition
- Metal or carbon structures
- Coating
- Atomic layer deposition
- Charge control
- Charge compensation, e.g. with argon
See it run
Advantages
Controlled dosing
- Nanomotor®-driven proportional valve releases gas in minute, repeatable amounts
- Slanted nozzle tip with a small aperture lets the beam reach the deposition site while gas flows
- Manipulator positions the outlet exactly where the chemistry needs to happen
Any precursor, solid or gas
- Reservoir accepts water, hexane, naphthalene, tungsten hexacarbonyl, iodine and more, heated to up to 90 °C to evaporate
- Swap the cap for an inlet to introduce argon, oxygen or gas mixtures directly
- Same tool covers metal/carbon deposition, atomic layer deposition and charge compensation
Plug-in design
- Retrofits to an existing MM3A-EM micromanipulator
- Refilling is as simple as removing the reservoir cap
Related products & accessories
MM3A-EM
The industry-standard spherical micromanipulator — the platform every Kleindiek plug-in tool attaches to, with 3000+ units in the field.
View product
Microinjection System MIS
A micro-valve plug-in for precise microinjection of liquids onto samples in the low-vacuum SEM, down to roughly 100 µm droplets.
View productTalk to an application engineer
Tell us your sample and your microscope — we’ll walk you through the workflow and route you to the right regional team.