LT6820
A 20 mm closed-loop linear/Z table with 100 nm encoder repeatability for lithography, cell counting and failure analysis.
Closing the loop on 68 millimetres#
The LT6820 covers the same 20 mm of X and Y travel as its open-loop sibling, the LT6620, plus an optional 15 mm Z axis, on a 68 × 68 mm stainless-steel deck. The difference is a pair of positional encoders on X and Y: closing the loop holds repeatability to 100 nm, and a third encoder can be added on Z. Steps still resolve below 0.02 nm, angular deviation stays under 10 µrad, and the stage runs at up to 2 mm/s carrying 500 g.
Built for the paper trail#
Where the LT6620 handles counting jobs, the LT6820 is specified for work that needs a record: eBeam lithography, tensile measurement, metrology and forensic analysis, alongside cell counting and failure analysis. Pair it with the 3PA software and you define three arbitrary points on the sample to align its own coordinate system with the stage’s axes — navigation then follows the chip’s geometry, not the table’s, regardless of how the sample was mounted.
Vacuum to 393 K#
Standard units run from atmosphere to 10⁻⁷ mbar between 273 K and 353 K. The UHV version reaches 2 × 10⁻¹⁰ mbar and 393 K, and non-magnetic and two-axis builds are available on request.
Technical data
Dimensions
- Length
- 68 mm
- Width
- 68 mm
- Height (XY)
- 26 mm
- Height (XYZ)
- 50 mm + 15 mm travel
- Weight (XY)
- 200 g
- Weight (XYZ)
- 270 g
Travel
- XY
- 20 mm
- Z
- 15 mm
- Speed
- up to 2 mm/s
Resolution & accuracy
- Resolution
- < 0.02 nm
- Encoder repeatability
- 100 nm
- Angular deviation (unidirectional)
- < 10 µrad
Load capacity
- Load
- 500 g
- Lift
- 200 g
Environment
- Temperature range
- 273 K – 353 K
- Temperature range (UHV version)
- 273 K – 393 K
- Lowest pressure
- 10⁻⁷ mbar
- Lowest pressure (UHV version)
- 2 × 10⁻¹⁰ mbar
Mounting & build
- Substage mounting
- 4 × 3.2 mm holes
- Sample mounting
- 4 × M3 holes
- Material
- Stainless steel
Advantages
Closed-loop repeatability
- Positional encoders give 100 nm repeatability on X and Y
- 20 mm of XY travel, optional 15 mm Z
- For lithography, cell counting and failure analysis
- 500 g load capacity, 200 g lift
Faster and more precise
- Resolution better than 0.02 nm
- Angular deviation below 10 µrad
- Encoder option extends to the Z axis
- Travel speed up to 2 mm/s
More robust and more stable
- Standard operation to 10⁻⁷ mbar
- UHV version reaches 2 × 10⁻¹⁰ mbar and 393 K
- Stainless-steel construction
- For atmosphere, SEM/FIB and UHV
Clearer and simpler
- 68 × 68 mm footprint
- Mounts via 4 × 3.2 mm holes
- Pairs with 3PA software for sample-coordinate navigation
- Fast setup and removal
Related products & accessories
Talk to an application engineer
Tell us your sample and your microscope — we’ll walk you through the workflow and route you to the right regional team.